Deep engraving, small field micro processing Priority choice for micro-processing

 

 

 

   CNC shell, dust prevention, compact structure, easy to integrate.

 

   Optional water cooling design, it can be applied to high-temperature drift requirements.

 

   Adopts the digital pulse width modulation driving technology,

   owns higher response speed and lower temperature drift.

 

 

 

     

 

          

                        FE10 (E10)                                            FE15 (E15)                                           FE20 (E20)

 

Highlight: drilling, high precision markingle

The focal point is controlled by the optical and is controllable by software, effectively reducing the collapse edge.
Dynamic focus can realize the 3D surface application.
No need for mechanical optical lifting, a simple structure, and easy to achieve automation, improve efficiency.

 

 

  High efficiency

   The dynamic axis and the XY axis are fully software coordinated, and the

   layered focus compensation is completed in microseconds with high efficiency.

 

 

 

 

 

  High precision

   With the switch of the processing depth, the dynamic axis coordinately adjusts

   the focal length and adjusts the center spot in real-time, which can achieve

   higher accuracy than traditional scanhead.

 

 

 

 

Application Highlight

●  Drilling

●  Engraving

●  Super precision marking

   

                      Glass drilling (different shape)                                                     Precision marking

 

   

                        Hard material deep carving                                                     Engraving (Knife tool)

 

 

Product Technical Information

 

Items	Output Voltage(VDC)	±15
	Current(A)	10A
	Protocol	XY2-100 Protocol
Cooling Condition	Cooling Media	Distilled or de-ionized water plus corrosion inhibitor
	Temperature(°C)	22-28
	Recommended cooling pressure(bar)	2-3
	Recommended flow rate(l/min)	4-6

 

Producr line	product line	E10	E15	E20
	Weight (KG)	5.6	6.7	9
	Size(mm)	297*125*120	339*125*120	337*134*153.5

 

Galvanometer Specifications		E10			E15			E20
	Version	Standard	Pro	P2	Standard	Pro	P2	Pro	P2
	Tracking error(ms)	±0.18	±0.18	±0.18	±0.21	±0.21	±0.2	±0.28	±0.27
	Repeatability(μrad)	8	8	5	8	8	5	8	5
	Temperature drift(μrad/k)	<2	<2	<1	<2	<2	<1	<2	<1
	Long-term drift(>24h, room temperature)(mrad)	≤0.2	≤0.2	≤0.1	≤0.2	≤0.2	≤0.1	≤0.2	≤0.1
	Max.processing speed(sharacters/s)(high-quality mode)	350 C/S@200x200
	Operating temperature(°C)	25℃±10℃

 

E10 Optical Specifications	Wavelength	355nm		532nm		1064nm
	Aperture Size(mm)	≤10mm		≤10mm		≤10mm
	Input magnification options	2X	2.66X	2X	2.66X	1.16X
	Z depth 1)	±5mm / ±25mm

 

E15 Optical Specifications	Wavelength	355nm		532nm		1064nm
	Aperture Size(mm)	≤15mm		≤15mm		≤15mm
	Input magnification options	2X	2.66X	2X	2.66X	1.16X
	Z depth 1)	±5mm / ±25mm

 

E20 Optical Specifications	Wavelength	1064nm
	Aperture Size(mm)	≤20mm
	Input magnification options	2.1X		2.57X		2.66X
	Z depth 3)	±5mm

1), 2), 3) Long focal length and short focal length version for option.The manual data is based on F-θ 254 under 150*150mm.

 

 

Mechanical Drawing

 

E10

E15

E20