Jasper X1 is the right choice whenever there is a need for high power and high pulse energy while maintaining very short pulse duration. Example applications include:

• Microelectronics – via drilling in glass, silicon, ceramics and organic substrates, panel cutting, dicing, glass cleaving, marking, repair, SLE, in-volume glass writing
• Micromachining – precision drilling, cutting, trimming
• Medical device manufacturing – stents, microfilters, microfluidics
• Surface engineering: activation before plating/bonding/dispensing, patterning molds, functionalisation, wettability control
• Material compatibility: semiconductors, metals, ceramics, glass, hard materials, crystalline materials, polymers

All specifications are subject to change without prior notice due to continuous improvements.

1. As a standard > 28 W will be delivered. > 30 W will be delivered upon request.
2. < 240 fs typical.
3. Maximum pulse repetition rate: 20.0 ± 0.5 MHz. Pulse picking up to 2 MHz. In Advanced Pulse-on-Demand version, pulses can be triggered externally up to 1.0 MHz in Stabilized Energy Mode.
4. PRR limit: 1000 ± 60 kHz. Enables constant pulse energy (Stabilized Energy Mode) at fluctuating PRR up to 1.0 MHz (enhanced corner processing and increased pulse positioning accuracy on the material). Constant pulse pitch in micromachining systems providing positioning synchronized output (PSO).
5. Setting arbitrary burst envelope and adjusting amplitude of individual pulse within a burst.
6. Available in High Energy Burst mode (HEB) with PRR reduced below nominal PRR. HEB is available in JX30-100 vartiant upon request.
7. 1/e², measured at 1 m.
8. NRMSD under stable environmental conditions.

If you require automatic wavelength selection, discover Harmonic Module.

Fluence Technology 명진크리스텍 MJL CRYSTEK Jasper X0 High Power Femtosecond Laser